HT Crystals for Film Thickness Monitoring (250-400°C)
- For processes that operate at temperatures above 100°C, standard quartz crystals are extremely noisy. This noise prevents accurate and stable film thickness measurements. To solve this problem, Colnatec has invented monitor crystals that operate stably above 100°C, are stress-insensitive, and can operate in plasmas. High temperature HT crystals can maintain operating efficiency at temperatures up to 300°C. The HT™ is ideal for processes requiring intense heat, such as ALD, CVD, OVPD, high temperature PVD, and thin film furnace processes such as selenization and indiffusion.
As an added benefit, the HT™ crystals can disregard the rate spike caused by temperature variances. This usually occurs when the deposition source shutter is opened or the crystal is exposed to plasmas. Typically, this action causes a frequency shift of up to 100 Hz, which translates to rate changes of 50 angstroms or more for films such as aluminum. Further, the noise associated with the intense energy of impinging atoms in sputtering is dramatically reduced, owing to the stress-insensitivity of the crystal. These are very real advantages in the measurement of nanometer films used in the manufacture of OLEDs, precision optical interference films, or next-generation electronic devices (e.g., solar cells).
Although it can be used effectively in place of standard AT-cut quartz in all commercially available film thickness monitors and controllers, HT crystals are ideally suited to Colnatec high temperature sensor heads. They are available in 5 or 6 MHz versions, with gold or aluminum electrodes, sized in 14mm and 12.5mm diameters.
Ready to learn more? Request our most recent data sheets or talk to our engineering team about your specific needs by contacting us at email@example.com or calling +1 480-634-1449.
HT Crystals (250-400°C)
Gold or Alloy
HT Crystals 5-pack
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